Focused X-ray beam allows high-resolution nanowire strain mapping

A team of researchers from Lund University and Northwestern University in the United States have used the nano focused beam at the NanoMAX beamline to construct a 2D map of the distribution of material strain in individual InP-GaInP heterostructure nanowires. Understanding the strain that forms in heterostructure nanowires is essential for tailoring their electronic properties to applications in electronics and for energy materials.

Semiconductor materials are essential for everything from electronics such as computers and mobile phones to LED-lights and solar cells. Different types of semiconductor materials often need to be combined in a so-called heterostructure to realise the advanced functions required for these devices.

Typically the combination is done by growing layers of one semiconductor material on top of another. However, since the distances between the atoms, the lattice spacing, is different in the different materials, it often leads to mismatch and strain in the materials when they are combined in this way. The mismatch puts a limit on what materials are possible to mix and how thick the layers can be.

Read more on the MAX IV website

Image: NanoMAX at Max IV