Urea susbstitutes noble metal catalysts

… for the photodegradation of organic polluants.

A new laser-based technique developed by the Institute of Materials Science (ICMAB-CSIC) uses urea, a common substance in the chemical industry and a low-cost alternative to noble metal co-catalyst, to enable a more efficient, one-step production of hybrid graphene-based organic-inorganic composite layers for environmental remediation, photodegradation of antibiotic contaminants from wastewater. The composition and chemical bonds of the urea-enriched thin layers were studied in detail using synchrotron light at the ALBA Synchrotron.
Human activity is increasing the amount of pollutants in water and air, as well as in all sorts of materials at home and work place. The existence of antibiotic contamination is undeniably one of the most threatening challenges to date, at a time when antibiotic-resistant bacteria has already been flagged as the next world-wide pandemic crisis.
Semiconductor photocatalysts have long been investigated for environmental remediation because they can degrade or mineralize a wide range of organic contaminants as well as pathogens. Research focuses on addressing some drawbacks that prevent their use on a large scale. On the one hand, many photocatalysts are activated only by UV radiation which represents solely a small fraction of the total available solar emission. On the other hand, the recombination of the photogenerated  electron-hole pairs that enable the decomposition of the pollutant is usually faster than the oxidation reactions that cause the degradation of organic molecules. As a consequence, noble metal co-catalysts acting as electron scavengers, such as gold or platinum, are needed in the process.

Image: Researchers Ángel Pérez  del Pino and Enikö György from the ICMAB-CSIC together with Ibraheem Yousef, scientists responsible of MIRAS beamline at ALBA.